| Tetramethyl ammonium hydroxide TMAH |
| General name |
TMAH（ tetramethyl ammonium hydroxide ） |
| Trade name |
SD-25 |
| Main application |
photoresist developer etc. |
| Product form |
ISO Tank, Power drum |
| Chemical formula |
C4H13NO |
| Characteristics |
TMAH concentration of 25%, low metal impurities，low chloride ion, low particles content |
| Description |
| This product uses high quality TMAH produced by Japanese parent company as raw material, with strict quality control and different types containers according to customer demand. |
| Application |
| Alkaline cleaning solution used for photoresist developer and electronic equipment, MEMS with Si etcher, CMP polishing raw materials |
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Tokuyama Chemicals(Zhejiang)CO.,Ltd.
Tel:+86-573-8552-7887
Fax:+86-573-8552-3355
Add:NO.555 Yashan West Road,Economic Development Zone,Zhapu Port,Jiaxing,Zhejiang,China.
Product Consultation ：
Tokuyama Trading(Shanghai)CO.,Ltd.
Tel:+86-21-6218-1177
Fax:+86-21-5382-2894
Add:1206, Shanghai International Group Mansion.511 Wei Hai Road, Shanghai, China.
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